TiO2 thin films have been deposited on different substrates by metal organic chemical vapor deposition and sol-gel techniques from the same precursor; titanium tetra isopropoxide. X-ray diffraction studies show that the deposited films by MOCVD are crystalline in the anatase phase, while films deposited by sol-gel technique are amorphous and transform to the crystalline phase due to annealing. UV-Vis-NIR spectrophotometry has been used to characterize the optical properties of the films. Chronoamperometery and cyclic voltammetry have been used to explore the electrochromic behavior of the deposited films. MOCVD films show superior electrochemical properties compared to sol-gel films.
(2016). Electrochromic Properties of TiO2 Thin Films Deposited by Metal Organic Chemical Vapor Deposition and Sol-Gel Techniques. Egyptian Journal of Solids, 39(1), 1-19. doi: 10.21608/ejs.2016.148269
MLA
. "Electrochromic Properties of TiO2 Thin Films Deposited by Metal Organic Chemical Vapor Deposition and Sol-Gel Techniques". Egyptian Journal of Solids, 39, 1, 2016, 1-19. doi: 10.21608/ejs.2016.148269
HARVARD
(2016). 'Electrochromic Properties of TiO2 Thin Films Deposited by Metal Organic Chemical Vapor Deposition and Sol-Gel Techniques', Egyptian Journal of Solids, 39(1), pp. 1-19. doi: 10.21608/ejs.2016.148269
VANCOUVER
Electrochromic Properties of TiO2 Thin Films Deposited by Metal Organic Chemical Vapor Deposition and Sol-Gel Techniques. Egyptian Journal of Solids, 2016; 39(1): 1-19. doi: 10.21608/ejs.2016.148269
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